|
| |
PETS Inc. Plasma
Enhanced Chemical Vapor Deposition System. Table Top
PETS Inc. Plasma
Enhanced Chemical Vapor Deposition System (With Floor Model Option).
Plasma Enhanced Chemical Vapor Deposition Systems are normally used for
depositing dielectric layers of Silicon Dioxide and Silicon Nitride onto
substrates. Conducting layers of Amorphous Silicon are also produced in these
systems.
Key Benefits
 | Computer operation guarantees identical process parameters from run to
run. |
| Data logging for every automatic run (event driven). |
| Store limitless number of recipes (.rcp files). |
| Chambers available in Anodized Aluminum or Stainless Steel. |
| Water cooled upper electrode, chamber and baseplate. |
| Aluminum Oxide (ceramic) insulator. |
| Add purging cycles if you wish. |
| + or - 5% uniformity guarantee. |
| Process support available. |
| System includes direct drive mechanical pump (14 cfm) with all connecting
fittings. |
| Choice of high frequency (13.56 MHz) or low frequency(40 KHz) power
supplies. |
| Options: Down Stream Pressure Control, Roots Blower Pumping, Scrubber, Oil
Filtration, Floor Model Cabinets and additional AFC's (Call for pricing). |
Pricing
| Description |
MODEL
# |
| 12" Al. Chamber, w/4 AFC's , Low Freq. RF |
PETS-PECVD-A12-4-LF |
| 12" SS Chamber, w/4 AFC's , Low Freq. RF |
PETS-PECVD-SS12-4-LF |
| 16" Al. Chamber, w/4 AFC's, Low Freq. RF |
PETS-PECVD-A16-4-LF |
| 16" SS Chamber, w/4 AFC's, Low Freq. RF |
PETS-PECVD-SS16-4-LF |
| 12" Al. Chamber, w/4 AFC's , High Freq. RF |
PETS-PECVD-A12-4-HF |
| 12" SS Chamber, w/4 AFC's , High Freq. RF |
PETS-PECVD-SS12-4-HF |
| 16" Al. Chamber, w/4 AFC's, High Freq. RF |
PETS-PECVD-A16-4-HF |
| 16" SS Chamber, w/4 AFC's, High Freq. RF |
PETS-PECVD-SS16-4-HF |
|
